System
15 micrographs for system Cu-P, ordered by micrograph number.
| Showing 1 - 10 of 15 micrographs | Page 1 2 | Previous | Next |
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Micrograph
695
:
Cu-4.5 wt% P System: Cu-P, Composition: Cu 95.5, P 4.5 (wt%) Reflected light microscopy 400 μm |
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Micrograph
696
:
Cu-4.5 wt% P System: Cu-P, Composition: Cu 95.5, P 4.5 (wt%) Reflected light microscopy 200 μm |
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Micrograph
697
:
Cu-4.5 wt% P System: Cu-P, Composition: Cu 95.5, P 4.5 (wt%) Reflected light microscopy 100 μm |
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Micrograph
698
:
Cu-4.5 wt% P System: Cu-P, Composition: Cu 95.5, P 4.5 (wt%) Reflected light microscopy 50 μm |
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Micrograph
699
:
Cu-4.5 wt% P System: Cu-P, Composition: Cu 95.5, P 4.5 (wt%) Reflected light microscopy 20 μm |
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Micrograph
700
:
Cu-10.5 wt% P System: Cu-P, Composition: Cu 89.5, P 10.5 (wt%) Reflected light microscopy 400 μm |
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Micrograph
701
:
Cu-10.5 wt% P System: Cu-P, Composition: Cu 89.5, P 10.5 (wt%) Reflected light microscopy 200 μm |
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Micrograph
702
:
Cu-10.5 wt% P System: Cu-P, Composition: Cu 89.5, P 10.5 (wt%) Reflected light microscopy 100 μm |
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Micrograph
703
:
Cu-10.5 wt% P System: Cu-P, Composition: Cu 89.5, P 10.5 (wt%) Reflected light microscopy 50 μm |
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Micrograph
704
:
Cu-10.5 wt% P System: Cu-P, Composition: Cu 89.5, P 10.5 (wt%) Reflected light microscopy 20 μm |
| Showing 1 - 10 of 15 micrographs | Page 1 2 | Previous | Next |











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