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Keyword
10 micrographs for keyword oxygen, ordered by micrograph number.
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Micrograph
150
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Alumina-zirconia-silica (AZS) refractory brick System: Al2O3-ZrO2-SiO2, Composition: Al2O3 50, ZrO2 32, SiO2 15 (wt%), + trace alkalis Reflected light microscopy 300 μm |
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Micrograph
151
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Alumina-graphite brick System: Al2O3-C-Si, Composition: Al2O3, C up to 30 (wt%), Si few% Reflected light microscopy 400 μm |
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Micrograph
152
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Barium Hexaferrite System: BaO-Fe2O3, Composition: BaO . 6Fe2O3 Reflected light microscopy 100 μm |
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Micrograph
153
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Barium Titanate Ag/Pd Multilayer Capacitor System: BaTiO3 Ag/Pd, Composition: BaTiO3 Reflected light microscopy 300 μm |
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Micrograph
154
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Macor(TM) Machinable Glass Ceramic System: MAS (MgO-Al2O3-SiO2), Composition: SiO2 47, B2O3 8, Al2O3 17, MgO 14, K2O 9, F 6 (wt%) Reflected light microscopy 20 μm |
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Micrograph
155
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Silica investment casting core System: SiO2, Composition: SiO2, trace of clay Reflected light microscopy 300 μm |
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Micrograph
170
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ZnO varistor System: ZnO, Composition: ZnO containing small amounts of oxides such as Sb2O3 and Bi2O3 Transmitted polarised light microscopy, with sensitive tint plate 100 μm |
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Micrograph
171
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ZnO varistor System: ZnO, Composition: ZnO containing small amounts of oxides such as Sb2O3 and Bi2O3 Transmitted polarised light microscopy, with sensitive tint plate 250 μm |
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Micrograph
435
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Tough pitch' nearly pure copper, with oxygen impurity System: Cu, Composition: Cu 99.7 (wt%), some oxygen Reflected light microscopy 400 μm |
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Micrograph
436
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Tough pitch' nearly pure copper, with oxygen impurity System: Cu, Composition: Cu 99.7 (wt%), some oxygen Reflected light microscopy 200 μm |