You should be able to answer these questions without too much difficulty after studying this TLP. If not, then you should go through it again!
Why are substrates often rotated during the deposition process?
What is an advantage of using electron beam evaporation over resistive heating evaporation?
Why is argon often used as the gas in the sputtering set up?
What effect does changing the angle of deposition have on the film?
What conditions are most likely to lead to Layer Growth?
The following questions are not provided with answers, but intended to provide food for thought and points for further discussion with other students and teachers.
Explain how Pulsed Laser Deposition allows coating of precise compositions of alloys and compounds.