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Full Record for Micrograph 125
- Micrograph no
- 125
- Brief description
- CMOS integrated circuit with Al wiring
- Keywords
- cross section, device, integrated circuit
- Categories
- Device
- System
- Miscellaneous
- Composition
- Not specified
- Standard codes
- Reaction
- Processing
- Applications
- Sample preparation
- Focused ion beam cross section
- Technique
- Focused ion beam (FIB) secondary electron image
- Length bar
- 2 μm
- Further information
- Close-up of Al wiring revealed in cross-section. Grain structure revealed by channelling contrast.
- Contributor
- Dr D F Moore
- Organisation
- Department of Engineering, University of Cambridge
- Date
- 03/01/02
- Licence for re-use
DoITPoMS standard terms of use- Related micrographs