Dissemination of IT for the Promotion of Materials Science (DoITPoMS)

DoITPoMS Micrograph Library Full Record for Micrograph 126

Full Record for Micrograph 126

Micrograph no
126
Brief description
CMOS integrated circuit with Al wiring
Keywords
cross section, device, integrated circuit Link to MATTER Glossary entry for integrated circuit
Categories
Device
System
Miscellaneous
Composition
Not specified
Standard codes
Reaction
Processing
Applications
Sample preparation
Focused ion beam cross section
Technique
Focused ion beam (FIB) secondary electron image
Length bar
15 μm
Further information
Al wiring revealed in cross-section. Upper metallisation layer contacts planarised lower wiring layer.
Contributor
Dr D F Moore
Organisation
Department of Engineering, University of Cambridge
Date
03/01/02
Licence for re-use
DoITPoMS standard terms of use
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