Dissemination of IT for the Promotion of Materials Science (DoITPoMS)

DoITPoMS Micrograph Library Full Record for Micrograph 127
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Full Record for Micrograph 127

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Micrograph no
127
Brief description
CMOS integrated circuit with Al wiring
Keywords
device, integrated circuit Link to MATTER Glossary entry for integrated circuit, passivated Link to MATTER Glossary entry for passivated, surface
Categories
Device
System
Miscellaneous
Composition
Not specified
Standard codes
Reaction
Processing
Applications
Sample preparation
Technique
Focused ion beam (FIB) secondary electron image
Length bar
40 μm
Further information
Upper surface completed. Smooth dielectric coating applied for protection purposes. The depressions associated with the contacts are clearly visible.
Contributor
Dr D F Moore
Organisation
Department of Engineering, University of Cambridge
Date
03/01/02
Licence for re-use
DoITPoMS standard terms of use
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